Intel is receiving its second High-NA EUV machine, according to CEO Pat Gelsinger.
The chief executive officer gave the update during a conference call on financial results. “The second High NA tool is coming into our Oregon facility,” Gelsinger said. He added that previous tech investments are showing positive initial signs.
Intel received the first High-NA EUV machine in December. Installing the new machines will take months. Much is expected of the machines as they are capable of producing smaller processors, leading to faster and more efficient chips.
Meanwhile, the machine that arrived in December coated a silicon disk with a line 10 nanometers wide. Using extreme ultraviolet light, several machines will enable the smallest semiconductors to be mass produced in a few years.
Market waits for High-NA EUV
ASML has billions in orders coming in. In addition to Intel, Samsung, TSMC, Micron and SK Hynix will also receive the machines. Intel plans to use the technology in commercial production by 2027. From TSMC, which produces chips for Nvidia and Apple, production plans are still unclear.
As recently as July 17, ASML announced that it had begun delivery of the second High-NA EUV machine. Now, this machine appears to be going to Intel, as this chipmaker will receive all of ASML’s High-NA EUV machines this year.
For Intel, innovation using the machines could be a welcome refreshment. The company took another big hit in the stock market on Friday, partly because it has been blamed for not innovating fast enough.